(HfZrTaW)C高熵碳化物薄膜结构调控与耐磨性能研究
编号：362
稿件编号：377 访问权限：仅限参会人
更新：2026-04-01 16:39:10 浏览：25次
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报告开始：2026年04月28日 11:30 （Asia/Shanghai）
报告时间：10min
所在会议：[B] 薄膜科技论坛 » [B1] B上午场
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摘要
摘要：为进一步提升高熵碳化物体系(HfZrTaW)C的力学性能和耐磨性能，本研究采用磁控溅射沉积技术，通过优化制备工艺参数，研究靶材功率和基底温度对薄膜生长模式、结晶行为、相结构演变、表面形貌及力学与耐磨性能的调控规律。石墨与金属靶材功率比（C:M）对高熵碳化物薄膜的微观结构和力学性能具有决定性影响。当C:M 为2:1时，薄膜由非晶结构转变为FCC结构固溶体，C-Me键与sp³杂化碳增强，力学性能显著提升，硬度可达32.74±1.46 GPa，弹性模量为331.67±18.57 GPa。耐磨性能同样得到明显改善，磨损率相比C:M 为1:2的样品下降两个数量级，磨损机制由粘着-剥落为主转变为轻微磨粒磨损。基底温度升高显著优化了薄膜的晶体结构、微观形貌及磨损性能。随着基底温度从室温升至600℃，薄膜逐渐由非晶、WC相和FCC固溶体混合相转变为单一FCC固溶体结构，WC第二相完全溶解。微观形貌由细小针尖团簇转变为致密多边形结构，柱状晶细化且均匀。以上结构优化使600℃时制备薄膜的硬度达到51.34±3.4 GPa，弹性模量提升至448.96±31.36 GPa。摩擦性能方面，400℃样品因摩擦诱导生成石墨化碳层具备自润滑特性，达到最低的磨损率4.16×10-7 mm3·(N·m)-1。
Abastract: To further enhance the mechanical properties and wear resistance of the high-entropy carbide system (HfZrTaW)C, this study employed the magnetron sputtering deposition technique and optimized the preparation process parameters to investigate the regulatory laws of target power and substrate temperature on the growth mode, crystallization behavior, phase structure evolution, surface morphology, and mechanical and wear resistance of the films. The power ratio of graphite to metal target (C:M) has a decisive influence on the microstructure and mechanical properties of the high-entropy carbide films. When C:M is 2:1, the film transforms from an amorphous structure to a FCC solid solution, with enhanced C-Me bonds and sp³ hybridized carbon, resulting in a significant improvement in mechanical properties, with a hardness of 32.74 ± 1.46 GPa and an elastic modulus of 331.67 ± 18.57 GPa. The wear resistance has also been significantly improved, with the wear rate decreasing by two orders of magnitude compared to the sample with a C:M ratio of 1:2. The wear mechanism shifts from adhesive-peeling to mild abrasive wear. The substrate temperature increase significantly optimizes the crystal structure, microstructure, and wear performance of the films. As the substrate temperature rises from room temperature to 600°C, the film gradually transforms from a mixture of amorphous, WC phase, and FCC solid solution to a single FCC solid solution structure, with the WC second phase completely dissolved. The microstructure changes from fine needle clusters to a dense polygonal structure, and the columnar crystals become finer and more uniform. These structural optimizations result in a hardness of 51.34 ± 3.4 GPa and an elastic modulus of 448.96 ± 31.36 GPa at 600°C for the films prepared under these conditions. In terms of friction performance, the 400°C sample, due to the formation of graphitized carbon layers induced by friction, exhibits self-lubricating properties and achieves the lowest wear rate of 4.16×10-7 mm3·(N·m)-1.
Abastract: To further enhance the mechanical properties and wear resistance of the high-entropy carbide system (HfZrTaW)C, this study employed the magnetron sputtering deposition technique and optimized the preparation process parameters to investigate the regulatory laws of target power and substrate temperature on the growth mode, crystallization behavior, phase structure evolution, surface morphology, and mechanical and wear resistance of the films. The power ratio of graphite to metal target (C:M) has a decisive influence on the microstructure and mechanical properties of the high-entropy carbide films. When C:M is 2:1, the film transforms from an amorphous structure to a FCC solid solution, with enhanced C-Me bonds and sp³ hybridized carbon, resulting in a significant improvement in mechanical properties, with a hardness of 32.74 ± 1.46 GPa and an elastic modulus of 331.67 ± 18.57 GPa. The wear resistance has also been significantly improved, with the wear rate decreasing by two orders of magnitude compared to the sample with a C:M ratio of 1:2. The wear mechanism shifts from adhesive-peeling to mild abrasive wear. The substrate temperature increase significantly optimizes the crystal structure, microstructure, and wear performance of the films. As the substrate temperature rises from room temperature to 600°C, the film gradually transforms from a mixture of amorphous, WC phase, and FCC solid solution to a single FCC solid solution structure, with the WC second phase completely dissolved. The microstructure changes from fine needle clusters to a dense polygonal structure, and the columnar crystals become finer and more uniform. These structural optimizations result in a hardness of 51.34 ± 3.4 GPa and an elastic modulus of 448.96 ± 31.36 GPa at 600°C for the films prepared under these conditions. In terms of friction performance, the 400°C sample, due to the formation of graphitized carbon layers induced by friction, exhibits self-lubricating properties and achieves the lowest wear rate of 4.16×10-7 mm3·(N·m)-1.
关键字
磁控溅射,高熵碳化物,薄膜,力学性能,摩擦磨损
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